danДоклады Национальной академии наук БеларусиDoklady of the National Academy of Sciences of Belarus1561-83232524-2431The Republican Unitary Enterprise Publishing House "Belaruskaya Navuka"10.29235/1561-8323-2018-62-4-415-422dan-535Research ArticleФИЗИКАPHYSICSВЛИЯНИЕ ТЕМПЕРАТУРЫ НАГРЕВА ПОДЛОЖЕК И ПОТЕНЦИАЛА СМЕЩЕНИЯ НА ОПТИЧЕСКИЕ ХАРАКТЕРИСТИКИ Ti–Al–C–N ПОКРЫТИЙINFLUENCE OF SUBSTRATE HEATING AND BIAS POTENTIAL ON THE Ti Al C N COATINGS OPTICAL CHARACTERISTICSКлимовичИ. М.KlimovichIryna M.

Климович Ирина Михайловна – аспирант

пр. Независимости, 4, 220030, Минск

Klimovich Iryna Mikhailovna – Postgraduate student

4, Nezavisimosti Ave., 220030, Minsk

imklimovich@gmail.comКомаровФ. Ф.KomarovFadei F.

Комаров Фадей Фадеевич – член-корреспондент, д-р физ.-мат. наук, профессор, заведующий лабораторией.

ул. Курчатова, 7, 220045, Минск

Komarov Fadei Fadeevich – Corresponding Member, D. Sc. (Physics and Mathematics), Professor, Head of the Laboratory

7, Kurchatov Str., 220045, Minsk

komarovf@bsu.byЗайковВ. А.ZaikovValery A.

Зайков Валерий Александрович – ст. преподаватель

пр. Независимости, 4, 220030, Минск

Zaikov Valery Aleksandrovich – Senior Lecturer

4, Nezavisimosti Ave., 220030, Minsk

valery48@tut.byБелорусский государственный университетBelarusian State UniversityИнститут прикладных физических проблем им. А. Н. Севченко, Белорусский государственный университетA. N. Sevchenko Institute of Applied Physics Problems of the Belarusian State University201812092018624415422Copyright © Климович И.М., Комаров Ф.Ф., Зайков В.А., 20182018Климович И.М., Комаров Ф.Ф., Зайков В.А.Klimovich I.M., Komarov F.F., Zaikov V.A.Данная работа распространяется под лицензией Creative Commons Attribution 4.0.This work is licensed under a Creative Commons Attribution 4.0 License.https://doklady.belnauka.by/jour/article/view/535

Покрытия Ti–Al–C–N формировались методом реактивного магнетронного осаждения при различных температурах нагрева Ts (220, 340 и 440 °C) и потенциалах смещения Uсм (–90, –150 и –200 В) на подложке. Методом энергодисперсионной рентгеновской спектроскопии установлено, что повышение Uсм приводит к увеличению атомарной концентрации аргона и соотношения (Al + Ti) / (Ti + N) и уменьшению концентрации кислорода в составе покрытий Ti–Al–C–N, а повышение Ts способствует уменьшению фоновой концентрации кислорода. С помощью растровой электронной микроскопии зафиксирована смена типа структуры покрытий (столбчатая, зернистая и смешанная столбчато-зернистая) при изменении Ts и Uсм. Электрофизические измерения показали изменение удельных сопротивлений пленок в пределах от 1982 до 3169 мкОм · см при изменении технологических условий осаждения. При варьировании Ts и Uсм коэффициенты солнечного поглощения αs менялись в пределах от 0,24 до 0,54, излучения – от 0,33 до 0,52, и соотношения αs / ε – от 0,60 до 1,44. Полученные результаты свидетельствуют о возможности варьирования электрофизических и оптических характеристик пленок Ti–Al–C–N путем выбора оптимальных условий их формирования – температуры нагрева подложки и потенциала смещения.

Ti–Al–C–N coatings were produced by reactive magnetron deposition at different substrate temperatures Ts (220, 340 and 440 °C) and bias voltages Ubias (–90, –150 and –200 V). Using the energy dispersive X-ray spectroscopy method, it was found that the increase of the bias voltage led to a growth of argon atomic concentration and the (Al + Ti) / (Ti + N) ratio and to a decrease of the trace oxygen concentration in Ti–Al–C–N coatings. The growth of Ts promoted a decrease in the oxygen concentration. By means of scanning electron microscopy, a change in the type of the microstructure (columnar, granular and mixed columnar-granular) of coatings by varying Ts and Ubias was found. Electrophysical measurements showed the change of the film resistivity (1982–3169 μΩ · cm) when the deposition conditions were varied. The solar absorptance αs was varied from 0.24 to 0.54, the emittance ε was varied from 0.33 to 0.52, and the αs / ε ratio was varied from 0.60 to 1.44 by changing Ts and Ubias. The obtained results indicate the opportunity to vary the Ti–Al–C–N films electrophysical and optical characteristics by choosing optimal substrate heating temperature and bias voltage.

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The authors declare that there are no conflicts of interest present.