<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "JATS-journalpublishing1-3.dtd">
<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">dan</journal-id><journal-title-group><journal-title xml:lang="ru">Доклады Национальной академии наук Беларуси</journal-title><trans-title-group xml:lang="en"><trans-title>Doklady of the National Academy of Sciences of Belarus</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1561-8323</issn><issn pub-type="epub">2524-2431</issn><publisher><publisher-name>The Republican Unitary Enterprise Publishing House "Belaruskaya Navuka"</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.29235/1561-8323-2018-62-5-540-545</article-id><article-id custom-type="elpub" pub-id-type="custom">dan-550</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ФИЗИКА</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>PHYSICS</subject></subj-group></article-categories><title-group><article-title>Влияние положения уровня Ферми  на отжиг дефекта межузельный атом углерода в кремнии</article-title><trans-title-group xml:lang="en"><trans-title>Effect of the Fermi level position on the annealing characteristic  of interstitial carbon defect in silicon</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Коршунов</surname><given-names>Ф. П.</given-names></name><name name-style="western" xml:lang="en"><surname>Korshunov</surname><given-names>F. P.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Коршунов Федор Павлович – член-корреспондент, доктор технических наук, профессор, главный научный сотрудник.</p><p>Ул. П. Бровки, 19, 220072, Минск</p></bio><bio xml:lang="en"><p>Korshunov Fedor Pavlovich – Corresponding Member, D. Sc. (Engineering), Professor, Chief researcher.</p><p>19, P. Brovka Str., 220072, Minsk</p></bio><email xlink:type="simple">korshun@ifttp.bas-net.by</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Ластовский</surname><given-names>С. Б.</given-names></name><name name-style="western" xml:lang="en"><surname>Lastovskii</surname><given-names>S. В.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Ластовский Станислав Брониславович – кандидат физико-математических наук, заведующий лабораторией.</p><p>Ул. П. Бровки, 19, 220072, Минск</p></bio><bio xml:lang="en"><p>Lastovskii Stanislav Bronislavovich – Ph. D. (Physics and Mathematics), Head of the laboratory.</p><p>19, P. Brov ka Str., 220072, Minsk</p></bio><email xlink:type="simple">lastov@ifttp.basnet.by</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Якушевич</surname><given-names>А. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Yakushevich</surname><given-names>H. S.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Якушевич Анна Сергеевна – младший научный сотрудник.</p><p>Ул. П. Бровки, 19, 220072, Минск</p></bio><bio xml:lang="en"><p>Yakushevich Hanna Sergeevna – Junior researcher.</p><p>19, P. Brovka Str., 220072, Minsk</p></bio><email xlink:type="simple">yakushevich@ifttp.bas-net.by</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Маркевич</surname><given-names>В. П.</given-names></name><name name-style="western" xml:lang="en"><surname>Markevich</surname><given-names>V. P.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Маркевич Владимир Павлович – кандидат физико-математических наук, научный сотрудник.</p><p>Ул. Sackville, Манчестер M139Pl</p></bio><bio xml:lang="en"><p>Markevich Vladimir Pavlovich – Ph. D. (Physics and Mathematics), Researcher.</p><p>Sackville Str., Manchester M139Pl</p></bio><email xlink:type="simple">V.Markevich@manchester.ac.uk</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Мурин</surname><given-names>Л. И.</given-names></name><name name-style="western" xml:lang="en"><surname>Murin</surname><given-names>L. I.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Мурин Леонид Иванович – кандидат физико-математических наук, ведущий научный сотрудник.</p><p>Ул. П. Бровки, 19, 220072, Минск</p></bio><bio xml:lang="en"><p>Murin Leonid Ivanovich – Ph. D. (Physics and Mathematics), leading Researcher.</p><p>19, P. Brovka Str., 220072, Minsk</p></bio><email xlink:type="simple">murin@ifttp.bas-net.by</email><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Научно-практический центр Национальной академии наук Беларуси по материаловедению</institution></aff><aff xml:lang="en"><institution>Scientific-Practical Materials Research Centre of the National Academy of Sciences of Belarus</institution></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>Университет г. Манчестер</institution></aff><aff xml:lang="en"><institution>Manchester University</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2018</year></pub-date><pub-date pub-type="epub"><day>29</day><month>10</month><year>2018</year></pub-date><volume>62</volume><issue>5</issue><fpage>540</fpage><lpage>545</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Коршунов Ф.П., Ластовский С.Б., Якушевич А.С., Маркевич В.П., Мурин Л.И., 2018</copyright-statement><copyright-year>2018</copyright-year><copyright-holder xml:lang="ru">Коршунов Ф.П., Ластовский С.Б., Якушевич А.С., Маркевич В.П., Мурин Л.И.</copyright-holder><copyright-holder xml:lang="en">Korshunov F.P., Lastovskii S.В., Yakushevich H.S., Markevich V.P., Murin L.I.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://doklady.belnauka.by/jour/article/view/550">https://doklady.belnauka.by/jour/article/view/550</self-uri><abstract><p>Методом DlTS изучено влияние зарядового состояния межузельного углерода (Сi ) на кинетику его отжига в облученных быстрыми электронами и α-частицами п+–р-структурах, изготовленных на кристаллах кремния, легированных бором (NB = 5 · 1013 и 2,5 · 1015 см–3). Отжиги проводились как с приложением обратного смещения, так и без смещения. Показано, что в положительном зарядовом состоянии дефекта энергия активации отжига составляет ΔE = 0,88 эВ, а в нейтральном зарядовом состоянии ΔE = 0,73 эВ. Отличаются и значения частотных факторов, даже при одной и той же концентрации стоков для Сi.</p></abstract><trans-abstract xml:lang="en"><p>We present experimental results showing that the migration ability of interstitial carbon atom (Сi) in silicon depends noticeably on its charge state. The experimental results were obtained from the analysis of deep level transient spectra in n+–p diodes subjected to irradiation with 4–6 MeV electrons or α-particles at T &lt; 273 k and subsequent heat-treatments in the temperature range 280–330 k under reverse bias and without it. It has been found that in the positive charge state the Сi migration energy is 0.88 ± 0.02 eV, while in the neutral charge state it is lowered down to 0.73–0.74 eV.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>кремний</kwd><kwd>облучение</kwd><kwd>дефекты</kwd><kwd>отжиг</kwd><kwd>межузельные атомы углерода</kwd><kwd>зарядовое состояние</kwd></kwd-group><kwd-group xml:lang="en"><kwd>silicon</kwd><kwd>irradiation</kwd><kwd>defects</kwd><kwd>annealing</kwd><kwd>interstitial carbon</kwd><kwd>charge state</kwd></kwd-group><funding-group><funding-statement xml:lang="ru">Белорусский республиканский фонд фундаментальных исследований, грант Ф17МС-022</funding-statement><funding-statement xml:lang="en">Belarusian Foundation for Basic Research, project no. Ф17МС-022</funding-statement></funding-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Davies, G. Carbon in monocrystalline silicon / G. Davies, R. C. Newman // Handbook on semiconductors; eds. T. S. Moss, S. Mahajan. - Amsterdam, 1994. - Vol. 3. - P. 1557-1643. https://doi.org/10.1016/s0080-8784(08)60251-3</mixed-citation><mixed-citation xml:lang="en">Davies G., Newman R. C. Carbon in monocrystalline silicon. Moss T. S., Mahajan S., eds. Handbook on semiconductors. Amsterdam, 1994, vol. 3, pp. 1557-1643. https://doi.org/10.1002/cvde.19960020108</mixed-citation></citation-alternatives></ref><ref id="cit2"><label>2</label><citation-alternatives><mixed-citation xml:lang="ru">Reactions of interstitial carbon with impurities in silicon particle detectors / L. F. Makarenko [et al.] // J. Appl. Phys. -2007. - Vol. 101, N 11. - P. 113537(1-6). https://doi.org/10.1063/L2745328</mixed-citation><mixed-citation xml:lang="en">Makarenko L. F., Moll M., Korshunov F. P., Lastovski S. B. Reactions of interstitial carbon with impurities in silicon particle detectors. Journal of Applied Physics, 2007. vol. 101, no. 11, pp. 113537(1-6). https://doi.org/10.1063/L2745328</mixed-citation></citation-alternatives></ref><ref id="cit3"><label>3</label><citation-alternatives><mixed-citation xml:lang="ru">Bean, A. R. Low temperature electron irradiation of silicon containing carbon / A. R. Bean, R. C. Newman // Solid State Commun. - 1970. - Vol. 8, N 3. - P. 175-177. https://doi.org/10.1016/0038-1098(70)90074-8</mixed-citation><mixed-citation xml:lang="en">Bean A. R., Newman R. C. Low temperature electron irradiation of silicon containing carbon. Solid State Communications, 1970, vol. 8, no. 3, pp. 175-177. https://doi.org/10.1016/0038-1098(70)90074-8</mixed-citation></citation-alternatives></ref><ref id="cit4"><label>4</label><citation-alternatives><mixed-citation xml:lang="ru">Watkins, G. D. EPR observation of the isolated interstitial carbon atom in silicon / G. D. Watkins, K. L. Brower // Phys. Rev. Lett. - 1976 - Vol. 36, N 22. - P. 1329-1332. https://doi.org/10.1103/physrevlett.36.1329</mixed-citation><mixed-citation xml:lang="en">Watkins G. D., Brower K. L. EPR observation of the isolated interstitial carbon atom in silicon. Physical Review Letters, 1976, vol. 36, no. 22, pp. 1329-1332. https://doi.org/10.1103/physrevlett.36.1329</mixed-citation></citation-alternatives></ref><ref id="cit5"><label>5</label><citation-alternatives><mixed-citation xml:lang="ru">Song, L. W. EPR identification of the single-acceptor state of interstitial carbon in silicon / L. W. Song, G. D. Watkins // Phys. Rev. B. - 1990 - Vol. 42, N 9. - P. 5759-5764. https://doi.org/10.1103/physrevb.42.5759</mixed-citation><mixed-citation xml:lang="en">Song L. W., Watkins G. D. EPR identification of the single-acceptor state of interstitial carbon in silicon. Physical Review B, 1990, Vol. 42, no. 9, pp. 5759-5764. https://doi.org/10.1103/physrevb.42.5759</mixed-citation></citation-alternatives></ref><ref id="cit6"><label>6</label><citation-alternatives><mixed-citation xml:lang="ru">Electronic and vibrational absorption of interstitial carbon in silicon / R. A. Woolley [et al.] // Mater. Sci. Forum. -1986. - Vol. 10-12. - P. 929-934. https://doi.org/10.4028/www.scientific.net/msf.10-12.929</mixed-citation><mixed-citation xml:lang="en">Woolley R. A., Woolley R., Lightowlers E. C., Tipping A. K., Claybourn M., Newman R. C. Electronic and vibrational absorption of interstitial carbon in silicon. Materials Science Forum, 1986, vol. 10-12, pp. 929-934. https://doi.org/10.4028/ www.scientific.net/msf.10-12.929</mixed-citation></citation-alternatives></ref><ref id="cit7"><label>7</label><citation-alternatives><mixed-citation xml:lang="ru">Thonke, K. New photoluminescence defect spectra in silicon irradiated at 100 K: observation of interstitial carbon / K. Thonke, A. Teschner, R. Sauer // Solid State Commun. - 1987. - Vol. 61, N 4. - P. 241-244. https://doi.org/10.1016/0038-1098(87)91010-6</mixed-citation><mixed-citation xml:lang="en">Thonke K., Teschner A., Sauer R. New photoluminescence defect spectra in silicon irradiated at 100 K: observation of interstitial carbon. Solid State Communications, 1987, vol. 61, no. 4, pp. 241-244. https://doi.org/10.1016/0038-1098(87)91010-6</mixed-citation></citation-alternatives></ref><ref id="cit8"><label>8</label><citation-alternatives><mixed-citation xml:lang="ru">Carbon interstitial in electron-irradiated silicon / Y. H. Lee [et al.] // Solid State Commun. - 1977. - Vol. 21, N 1. -P. 109-111. https://doi.org/10.1016/0038-1098(77)91489-2</mixed-citation><mixed-citation xml:lang="en">Lee Y. H., Cheng L. J., Gerson J. D., Mooney P. M., Corbett J. W. Carbon interstitial in electron-irradiated silicon. Solid State Communications, 1977, vol. 21, no. 1, pp. 109-111. https://doi.org/10.1016/0038-1098(77)91489-2</mixed-citation></citation-alternatives></ref><ref id="cit9"><label>9</label><citation-alternatives><mixed-citation xml:lang="ru">Kimerling, L. C. Defect states in proton-bombarded silicon at T &lt; 300 K / L. C. Kimerling, P. Blood, W. M. Gibson // Defects and radiation effects in semiconductors, 1978 / ed. J. H. Albany. - London; Bristol: Institute of Physics, 1979. -Ser. 46. - P. 273-280.</mixed-citation><mixed-citation xml:lang="en">Kimerling L. C., Blood P., Gibson W. M. Defect states in proton-bombarded silicon at T &lt; 300 K. Albany J. H. (ed.). Defects and radiation effects in semiconductors. London, Bristol, Institute of Physics, 1979, ser. 46, pp. 273-280.</mixed-citation></citation-alternatives></ref><ref id="cit10"><label>10</label><citation-alternatives><mixed-citation xml:lang="ru">Djerassi, H. Effects of 60Co y-rays on high resistivity p-type Si / H. Djerassi, J. Merlo-Flores, J. Messier // J. Appl. Phys. - 1966. - Vol. 37, N 12. - P. 4510-4516. https://doi.org/10.1063/L1708071</mixed-citation><mixed-citation xml:lang="en">Djerassi H., Merlo-Flores J., Messier J. Effects of 60Co y-rays on high resistivity p-type Si. Journal of Applied Physics, 1966, vol. 37, no. 12, pp. 4510-4516. https://doi.org/10.1063/L1708071</mixed-citation></citation-alternatives></ref><ref id="cit11"><label>11</label><citation-alternatives><mixed-citation xml:lang="ru">Электрически активные дефекты межузельного типа в облученном n-кремнии / А. Г Литвинко [и др.] // ФТП. -1980. - Т. 14, № 4. - С. 776-780.</mixed-citation><mixed-citation xml:lang="en">Litvinko A. G., Makarenko L. F., Murin L. I., Tkachev V. D. Electrically active interstitial defects in irradiated n-sili-con. Fizika i tekhnika poluprovodnikov = Semiconductors, 1980, vol. 14, no. 4, pp. 776-780 (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit12"><label>12</label><citation-alternatives><mixed-citation xml:lang="ru">Efficiency of interaction of interstitial carbon with oxygen, tin, and substitution carbon in irradiated silicon / M. I. Gritsenko [et al.] // Ukr. J. Phys. - 2010. - Vol. 55, N 2. - P. 222-227.</mixed-citation><mixed-citation xml:lang="en">Gritsenko M. I., Kobzar O. O., Pomozov Y. V., Sosnin M. G., Khirunenko L. I. Efficiency of interaction of interstitial carbon with oxygen, tin, and substitution carbon in irradiated silicon. Ukrainian Journal of Physics, 2010, vol. 55, no. 2, pp. 222-227.</mixed-citation></citation-alternatives></ref><ref id="cit13"><label>13</label><citation-alternatives><mixed-citation xml:lang="ru">Studies of defects introduced by electron irradiation at 4.2 K in p-silicon by thermally stimulated capacitance technique / J. C. Brabant [et al.] // J. Appl. Phys. - 1976. - Vol. 47, N 11. - P. 4809-4813. https://doi.org/10.1063/L322522</mixed-citation><mixed-citation xml:lang="en">Brabant J. C., Pugnet M., Barbolla J., Brousseau M. Studies of defects introduced by electron irradiation at 4.2 K in p-silicon by thermally stimulated capacitance technique. Journal of Applied Physics, 1976, vol. 47, no. 11, pp. 4809-4813. https://doi.org/10.1063/L322522</mixed-citation></citation-alternatives></ref><ref id="cit14"><label>14</label><citation-alternatives><mixed-citation xml:lang="ru">Tipping, A. K. The diffusion coefficient of interstitial carbon in silicon / A. K. Tipping, R. C. Newman // Semicond. Sci. Technol. - 1987. - Vol. 2, N 5. - P. 315-317. https://doi.org/10.1088/0268-1242/2/5/013</mixed-citation><mixed-citation xml:lang="en">Tipping A. K., Newman R. C. The diffusion coefficient of interstitial carbon in silicon. Semiconductor Science and Technology, 1987, vol. 2, no. 5, pp. 315-317. https://doi.org/10.1088/0268-1242/2/5/013</mixed-citation></citation-alternatives></ref><ref id="cit15"><label>15</label><citation-alternatives><mixed-citation xml:lang="ru">Green, M. A. Intrinsic concentration, effective densities of states, and effective mass in silicon / M. A. Green // J. Appl. Phys. - 1990. - Vol. 67, N 6. - P. 2944-2954. https://doi.org/10.1063/L345414</mixed-citation><mixed-citation xml:lang="en">Green M. A. Intrinsic concentration, effective densities of states, and effective mass in silicon. Journal of Applied Physics, 1990, vol. 67, no. 6, pp. 2944-2954. https://doi.org/10.1063/L345414</mixed-citation></citation-alternatives></ref></ref-list><fn-group><fn fn-type="conflict"><p>The authors declare that there are no conflicts of interest present.</p></fn></fn-group></back></article>
