INORGANIC PHOTORESISTS BASED ON MIXED OXIDES OF MOLYBDENUM AND VANADIUM
Abstract
The possibility of application of thin films of molybdenum-vanadium oxide as the photoresist material was demonstrated. The photosensitivity of such a system was due to the photo-induced polycondensation of polymolybdic acid oligomers in xerogel V2O5 : MoO3 films.
About the Authors
A. A. BARABOSHINA
Belаrusian State University, Minsk
Belarus
Belarus
T. V. SVIRIDOVA
Belаrusian State University, Minsk
Belarus
Belarus
L. S. TSYBULSKAJA
Belаrusian State University, Minsk
Belarus
Belarus
A. I. KOKORIN
Semenov Institute of Chemical Physics of Russian Academy of Sciences, Moscow
Russian Federation
Russian Federation
D. V. SVIRIDOV
Belаrusian State University, Minsk
Belarus
Belarus
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