FEATURES OF FORMATION OF THIN SILICON COATINGS DEPOSITED BY MAGNETRON SPUTTERING
Abstract
The surface morphology and optical properties of Si coatings formed by magnetron sputtering were studied using atomic force microscopy, scanning electron microscopy, and spectrophotometry methods. The possibility to influence the surface morphology of coating (filamentous structures and/or round holes) and the location of maxima and minima in reflectance and transmittance via a controllable variation of magnetron sputtering regimes (substrate temperature and bias potential) is shown.
Keywords
About the Authors
Iryna M. KlimovichBelarus
Junior researcher
1, Kurchatov Str., 220045
Ivan A. Romanov
Belarus
Junior researcher
1, Kurchatov Str., 220045
Fadei F. Komarov
Belarus
Corresponding Member, D. Sc. (Physics and Mathematics), Professor, Head of the Department
1, Kurchatov Str., 220045
Valery A. Zaikov
Belarus
Senior researcher
1, Kurchatov Str., 220045
Liudmila A. Vlasukova
Belarus
Ph. D. (Physics and Mathematics), Head of the Laboratory
1, Kurchatov Str., 220045
Yury N. Osin
Russian Federation
Director
10/7, Sibirskii trakt, 420029
Alexey M. Rogov
Russian Federation
Postgraduate student
10/7, Sibirskii trakt, 420029
Vyacheslav V. Vorob’ev
Russian Federation
Postgraduate student
10/7, Sibirskii trakt, 420029
Andrey L. Stepanov
Russian Federation
D. Sc. (Physics and Mathematics), Leading researcher
10/7, Sibirskii trakt, 420029
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